Справочник MOSFET. ME2309-G

 

ME2309-G MOSFET - описание производителя. Даташиты. Основные параметры и характеристики. Поиск аналога. Справочник


   Наименование прибора: ME2309-G
   Тип транзистора: MOSFET
   Полярность: P
   Pdⓘ - Максимальная рассеиваемая мощность: 1.4 W
   |Vds|ⓘ - Предельно допустимое напряжение сток-исток: 60 V
   |Vgs|ⓘ - Предельно допустимое напряжение затвор-исток: 20 V
   |Vgs(th)|ⓘ - Пороговое напряжение включения: 3 V
   |Id|ⓘ - Максимально допустимый постоянный ток стока: 1.9 A
   Tjⓘ - Максимальная температура канала: 150 °C
   Qgⓘ - Общий заряд затвора: 6.3 nC
   trⓘ - Время нарастания: 33.1 ns
   Cossⓘ - Выходная емкость: 23 pf
   Rdsⓘ - Сопротивление сток-исток открытого транзистора: 0.215 Ohm
   Тип корпуса: SOT-23

 Аналог (замена) для ME2309-G

 

 

ME2309-G Datasheet (PDF)

 ..1. Size:1070K  matsuki electric
me2309 me2309-g.pdf

ME2309-G
ME2309-G

ME2309/ ME2309-G P-Channel 60V (D-S) MOSFETGENERAL DESCRIPTION FEATURES The ME2309 is the P-Channel logic enhancement mode power field RDS(ON)215m@VGS=-10Veffect transistors are produced using high cell density, DMOS trench RDS(ON)260m@VGS=-4.5Vtechnology. This high density process is especially tailored to Super high density cell design for extremely low RDS(O

 9.1. Size:1599K  matsuki electric
me2306bs me2306bs-g.pdf

ME2309-G
ME2309-G

ME2306BS/ME2306BS-G N-Channel 30V (D-S)MOSFET GENERAL DESCRIPTION FEATURES The ME2306BS is the N-Channel logic enhancement mode power RDS(ON)38m@VGS=10V field effect transistor, using high cell density, DMOS trench RDS(ON)43m@VGS=4.5V technology. This high density process is especially tailored to RDS(ON)62m@VGS=2.5V minimize on-state resistance. These

 9.2. Size:1136K  matsuki electric
me2305 me2305-g.pdf

ME2309-G
ME2309-G

ME2305/ME2305-G P-Channel 20V (D-S) MOSFET GENERAL DESCRIPTION FEATURES The ME2305 is the P-Channel logic enhancement mode power RDS(ON)62m@VGS=-10V field effect transistors are produced using high cell density, DMOS RDS(ON)72m@VGS=-4.5V trench technology. This high density process is especially tailored RDS(ON)91m@VGS=-2.5V to minimize on-state resista

 9.3. Size:879K  matsuki electric
me2306n me2306n-g.pdf

ME2309-G
ME2309-G

ME2306N/ME2306N-G N-Channel 30V (D-S) MOSFETGENERAL DESCRIPTION FEATURES The ME2306N is the N-Channel logic enhancement mode power RDS(ON)37m@VGS=10Vfield effect transistors, using high cell density, DMOS trench RDS(ON)49m@VGS=4.5Vtechnology. This high density process is especially tailored to Super high density cell design for extremely low RDS(ON)mi

 9.4. Size:1077K  matsuki electric
me2301a me2301a-g.pdf

ME2309-G
ME2309-G

ME2301A/ ME2301A-G P-Channel 20V (D-S) MOSFET GENERAL DESCRIPTION FEATURES The ME2301A is the P-Channel logic enhancement mode power field RDS(ON) 75m@VGS=-4.5V effect transistors are produced using high cell density, DMOS trench RDS(ON) 95m@VGS=-2.5V technology. This high density process is especially tailored to RDS(ON) 130m@VGS=-1.8V minimize on-stat

 9.5. Size:1127K  matsuki electric
me2301 me2301-g.pdf

ME2309-G
ME2309-G

ME2301/ME2301-G P-Channel Enhancement Mode MosfetGENERAL DESCRIPTION FEATURES RDS(ON) 110m@VGS=-4.5V The ME2301 is the P-Channel logic enhancement mode power field RDS(ON) 150m@VGS=-2.5V effect transistors are produced using high cell density , DMOS trench Super high density cell design for extremely low RDS(ON) technology. This high density process is es

 9.6. Size:976K  matsuki electric
me2303 me2303-g.pdf

ME2309-G
ME2309-G

ME2303/ME2303-G P-Channel 30V (D-S) MOSFETGENERAL DESCRIPTION FEATURES The ME2303 is the P-Channel logic enhancement mode power field RDS(ON) 75m@VGS=-10Veffect transistors are produced using high cell density , DMOS trench RDS(ON) 100m@VGS=-4.5Vtechnology. This high density process is especially tailored to Super high density cell design for extremely low RDS(

 9.7. Size:1294K  matsuki electric
me2306s me2306s-g.pdf

ME2309-G
ME2309-G

ME2306S/ME2306S-G N-Channel 30V(D-S) MOSFET GENERAL DESCRIPTION FEATURES FEATURES RDS(ON)37m@ VGS =10V The ME2306S is the N-Channel logic enhancement mode power RDS(ON)49m@VGS=4.5V field effect transistors, using high cell density, DMOS trench Super high density cell design for extremely low RDS(ON) technology. This high density process is especially tailor

 9.8. Size:587K  matsuki electric
me2302.pdf

ME2309-G
ME2309-G

ME2302(Pb-free) N-Channel Enhancement Mode MOSFET GENERAL DESCRIPTION FEATURES The ME2302 is the N-Channel logic enhancement mode power field RDS(ON)85m@VGS=4.5V effect transistors, using high cell density, DMOS trench technology. RDS(ON)115m@VGS=2.5V This high density process is especially tailored to minimize on-state RDS(ON)135m@VGS=1.8V resistance.

 9.9. Size:730K  matsuki electric
me2306an me2306an-g.pdf

ME2309-G
ME2309-G

Preliminary-ME2306AN/ME2306AN-G N-Channel 30V (D-S) MOSFETGENERAL DESCRIPTIONFEATURES The ME2306AN is the N-Channel logic enhancement mode power RDS(ON)37m@VGS=10Vfield effect transistors, using high cell density, DMOS trench RDS(ON)40m@VGS=4.5Vtechnology. This high density process is especially tailored to RDS(ON)53m@VGS=2.5Vminimize on-state r

 9.10. Size:1115K  matsuki electric
me2306ds me2306ds-g.pdf

ME2309-G
ME2309-G

ME2306DS/ME2306DS-G N-Channel 30V (D-S) MOSFET , ESD ProtectedGENERAL DESCRIPTION FEATURES The ME2306DS is the N-Channel logic enhancement mode power RDS(ON)31m@VGS=10V field effect transistors are produced using high cell density , DMOS RDS(ON)52m@VGS=4.5V trench technology. This high density process is especially tailored to ESD Protected minimize on-state

 9.11. Size:1999K  matsuki electric
me2301dc me2301dc-g.pdf

ME2309-G
ME2309-G

ME2301DC/ME2301DC-G P-Channel 20V(D-S) MOSFET, ESD ProtectedGENERAL DESCRIPTION FEATURES The ME2301DC is the P-Channel logic enhancement mode power RDS(ON) 110m@VGS=-4.5Vfield effect transistors are produced using high cell density , DMOS RDS(ON) 150m@VGS=-2.5Vtrench technology. This high density process is especially tailored to Super high density cell design

 9.12. Size:1540K  matsuki electric
me2308s me2308s-g.pdf

ME2309-G
ME2309-G

ME2308S/ME2308S-G N-Channel 60V (D-S) MOSFETGENERAL DESCRIPTION FEATURES The ME2308S is the N-Channel logic enhancement mode power RDS(ON) 100m@VGS=10Vfield effect transistors are produced using high cell density, DMOS RDS(ON) 130m@VGS=4.5Vtrench technology. This high density process is especially tailored to Super high density cell design for extremely low RDS

 9.13. Size:1321K  matsuki electric
me2301gc me2301gc-g.pdf

ME2309-G
ME2309-G

ME2301GC/ ME2301GC-G P-Channel 20V (D-S) MOSFET GENERAL DESCRIPTION FEATURES RDS(ON) 75m@VGS=-4.5V The ME2301GC is the P-Channel logic enhancement mode power RDS(ON) 95m@VGS=-2.5V field effect transistors are produced using high cell density, DMOS RDS(ON) 130m@VGS=-1.8V trench technology. This high density process is especially tailored to Sup

 9.14. Size:1298K  matsuki electric
me2301dn me2301dn-g.pdf

ME2309-G
ME2309-G

ME2301DN/ME2301DN-G P-Channel 20V(D-S) MOSFET, ESD Protected GENERAL DESCRIPTION FEATURES The ME2301DN is the P-Channel logic enhancement mode power RDS(ON) 90m@VGS=-4.5V field effect transistors are produced using high cell density , DMOS RDS(ON) 130m@VGS=-2.5V trench technology. This high density process is especially tailored to Super high density cell desig

 9.15. Size:1039K  matsuki electric
me2306as me2306as-g.pdf

ME2309-G
ME2309-G

ME2306AS/ME2306AS-G N-Channel 30V (D-S)MOSFET GENERAL DESCRIPTION FEATURES The ME2306AS is the N-Channel logic enhancement mode power RDS(ON)34.5m@VGS=10V field effect transistors, using high cell density, DMOS trench RDS(ON)38m@VGS=4.5V technology.This high density process is especially tailored to RDS(ON)50m@VGS=2.5V minimize on-state resistance.These

 9.16. Size:1718K  matsuki electric
me2307 me2307-g.pdf

ME2309-G
ME2309-G

ME2307/ME2307-G P-Channel 30V (D-S) MOSFETGENERAL DESCRIPTION FEATURES The ME2307 is the P-Channel logic enhancement mode power field RDS(ON) 70m@VGS=-10Veffect transistors are produced using high cell density , DMOS trench RDS(ON) 95m@VGS=-4.5Vtechnology. This high density process is especially tailored to Super high density cell design for extremely low RDS(O

 9.17. Size:1057K  matsuki electric
me2305a me2305a-g.pdf

ME2309-G
ME2309-G

ME2305A/ME2305A-G P-Channel 20V (D-S) MOSFETGENERAL DESCRIPTION FEATURES The ME2305A is the P-Channel logic enhancement mode power RDS(ON)67m@VGS=-10Vfield effect transistors are produced using high cell density, DMOS RDS(ON)77m@VGS=-4.5Vtrench technology. This high density process is especially tailored RDS(ON)96m@VGS=-2.5Vto minimize on-state resistan

 9.18. Size:1457K  matsuki electric
me2306d me2306d-g.pdf

ME2309-G
ME2309-G

ME2306D/ME2306D-G N-Channel 30V (D-S) MOSFET , ESD ProtectedGENERAL DESCRIPTION FEATURES The ME2306D is the N-Channel logic enhancement mode power RDS(ON)31m@VGS=10V field effect transistors are produced using high cell density , DMOS RDS(ON)52m@VGS=4.5V trench technology. This high density process is especially tailored to ESD Protected minimize on-state res

 9.19. Size:1432K  matsuki electric
me2302 me2302-g.pdf

ME2309-G
ME2309-G

ME2302/ME2302-G N-Channel 20V(D-S) MOSFET GENERAL DESCRIPTION FEATURES The ME2302 is the N-Channel logic enhancement mode power field RDS(ON)85m@VGS=4.5V effect transistors, using high cell density, DMOS trench technology. RDS(ON)115m@VGS=2.5V This high density process is especially tailored to minimize on-state RDS(ON)130m@VGS=1.8V resistance.T

 9.20. Size:1009K  matsuki electric
me2301s me2301s-g.pdf

ME2309-G
ME2309-G

ME2301S/ME2301S-G P-Channel 20V (D-S) MOSFET GENERAL DESCRIPTION FEATURES RDS(ON) 110m@VGS=-4.5V The ME2301S is the P-Channel logic enhancement mode power field RDS(ON) 150m@VGS=-2.5V effect transistors are produced using high cell density , DMOS trench Super high density cell design for extremely low RDS(ON) technology. This high density process is espec

 9.21. Size:1045K  matsuki electric
me2306 me2306-g.pdf

ME2309-G
ME2309-G

ME2306/ME2306-G N-Channel Enhancement Mode MOSFETGENERAL DESCRIPTION FEATURES RDS(ON)37m@VGS=10V The ME2306 is the N-Channel logic enhancement mode power field RDS(ON)49m@VGS=4.5V effect transistors, using high cell density, DMOS trench technology. Super high density cell design for extremely low RDS(ON) This high density process is especially tailored to

 9.22. Size:921K  matsuki electric
me2308d me2308d-g.pdf

ME2309-G
ME2309-G

ME2308D/ME2308D-G N-Channel 30V (D-S) MOSFET ,ESD Protection GENERAL DESCRIPTION FEATURES The ME2308D is the N-Channel logic enhancement mode power RDS(ON)60m@VGS=10V field effect transistors are produced using high cell density, DMOS RDS(ON)70m@VGS=4.5V trench technology. This high density process is especially tailored to RDS(ON)100m@VGS=2.5V minimize

 9.23. Size:830K  matsuki electric
me2308dn-g.pdf

ME2309-G
ME2309-G

ME2308DN-G N-Channel 20V (D-S) MOSFET ,ESD ProtectionGENERAL DESCRIPTION FEATURES The ME2308DN-G is the N-Channel logic enhancement mode power RDS(ON) 0.35 @VGS=4.5Vfield effect transistors are produced using high cell density, DMOS RDS(ON) 0.45 @VGS=2.5Vtrench technology. This high density process is especially tailored to RDS(ON) 0.65 @VGS=1.8Vmini

 9.24. Size:1203K  matsuki electric
me2306a me2306a-g.pdf

ME2309-G
ME2309-G

ME2306A/ME2306A-G N-Channel 30V (D-S)MOSFET GENERAL DESCRIPTION FEATURES The ME2306A is the N-Channel logic enhancement mode power field RDS(ON)34.5m@VGS=10V effect transistors, using high cell density, DMOS trench technology. RDS(ON)38m@VGS=4.5V This high density process is especially tailored to minimize on-state RDS(ON)50m@VGS=2.5V resistance. Su

 9.25. Size:850K  cn vbsemi
me2308s.pdf

ME2309-G
ME2309-G

ME2308Swww.VBsemi.twN-Channel 30-V (D-S) MOSFETFEATURESPRODUCT SUMMARY Halogen-free According to IEC 61249-2-21VDS (V) RDS(on) ()ID (A)a Qg (Typ.)Definition0.030 at VGS = 10 V TrenchFET Power MOSFET6.530 4.5 nC 100 % Rg Tested0.033 at VGS = 4.5 V 6.0 Compliant to RoHS Directive 2002/95/ECAPPLICATIONS DC/DC ConverterDTO-236(SOT-23)G

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