NDS8961
MOSFET. Datasheet pdf. Equivalent
Type Designator: NDS8961
Type of Transistor: MOSFET
Type of Control Channel: N
-Channel
Pdⓘ
- Maximum Power Dissipation: 2
W
|Vds|ⓘ - Maximum Drain-Source Voltage: 30
V
|Id|ⓘ - Maximum Drain Current: 3.1
A
Tjⓘ - Maximum Junction Temperature: 150
°C
Rdsⓘ - Maximum Drain-Source On-State Resistance: 0.1
Ohm
Package:
SO8
NDS8961
Transistor Equivalent Substitute - MOSFET Cross-Reference Search
NDS8961
Datasheet (PDF)
9.1. Size:198K fairchild semi
nds8936.pdf 
June 1997 NDS8936Dual N-Channel Enhancement Mode Field Effect TransistorGeneral Description FeaturesThese N-Channel enhancement mode power field effect 5.3A, 30V. RDS(ON) = 0.035 @ VGS = 10Vtransistors are produced using Fairchild's proprietary, high cell RDS(ON) = 0.05 @ VGS = 4.5V.density, DMOS technology. This very high density process isespecially tailored to minimize
9.2. Size:222K fairchild semi
nds8958.pdf
July 1996 NDS8958Dual N & P-Channel Enhancement Mode Field Effect TransistorGeneral Description FeaturesThese dual N- and P-Channel enhancement mode power fieldN-Channel 5.3A, 30V, RDS(ON)=0.035 @ VGS=10V.effect transistors are produced using Fairchild's proprietary,P-Channel -4.0A, -30V, RDS(ON)=0.065 @ VGS=-10V. high cell density, DMOS technology. This very high density
9.3. Size:82K fairchild semi
nds8934.pdf
March 1996 NDS8934Dual P-Channel Enhancement Mode Field Effect TransistorGeneral Description FeaturesThese P-Channel enhancement mode power field effect-3.8A, -20V. RDS(ON) = 0.07 @ VGS = -4.5Vtransistors are produced using Fairchild's proprietary,RDS(ON) = 0.1 @ VGS = -2.7V.high cell density, DMOS technology. This very highHigh density cell design for extremely low RDS
9.4. Size:199K fairchild semi
nds8947.pdf
March 1996 NDS8947Dual P-Channel Enhancement Mode Field Effect TransistorGeneral Description FeaturesThese P-Channel enhancement mode power field effect -4A, -30V. RDS(ON) = 0.065 @ VGS = -10Vtransistors are produced using Fairchild's proprietary, high cell RDS(ON) = 0.1 @ VGS = -4.5V.density, DMOS technology. This very high density process isespecially tailored to minimi
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