All MOSFET. NDS9410A Datasheet

 

NDS9410A Datasheet and Replacement


   Type Designator: NDS9410A
   Type of Transistor: MOSFET
   Type of Control Channel: N -Channel
   Pdⓘ - Maximum Power Dissipation: 2.5 W
   |Vds|ⓘ - Maximum Drain-Source Voltage: 30 V
   |Vgs|ⓘ - Maximum Gate-Source Voltage: 20 V
   |Id|ⓘ - Maximum Drain Current: 7.3 A
   Tjⓘ - Maximum Junction Temperature: 150 °C
   Rdsⓘ - Maximum Drain-Source On-State Resistance: 0.028 Ohm
   Package: SO8
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NDS9410A Datasheet (PDF)

 ..1. Size:77K  fairchild semi
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NDS9410A

February 1996 NDS9410ASingle N-Channel Enhancement Mode Field Effect TransistorGeneral Description FeaturesThese N-Channel enhancement mode power field effect 7.3A, 30V. RDS(ON) = 0.028 @ VGS = 10V.transistors are produced using Fairchild's proprietary, high cell RDS(ON) = 0.042 @ VGS = 4.5V.density, DMOS technology. This very high density process isHigh density cell design

 ..2. Size:1573K  cn vbsemi
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NDS9410A

NDS9410Awww.VBsemi.twN-Channel 650 V (D-S) MOSFETFEATURESPRODUCT SUMMARY Low Gate Charge Qg Results in Simple DriveVDS (V) 650AvailableRequirementRDS(on) ()VGS = 10 V 3.8RoHS Improved Gate, Avalanche and Dynamic dV/dtQg (Max.) (nC) 15RuggednessQgs (nC) 3 Fully Characterized Capacitance and Avalanche Voltageand CurrentQgd (nC) 6 Compliant to RoHS

 9.1. Size:197K  fairchild semi
nds9400a.pdf pdf_icon

NDS9410A

February 1996 NDS9400ASingle P-Channel Enhancement Mode Field Effect TransistorGeneral Description FeaturesThese P-Channel enhancement mode power field effect -3.4A, -30V. RDS(ON) = 0.13 @ VGS = -10V.transistors are produced using Fairchild's proprietary, high cellHigh density cell design for extremely low RDS(ON).density, DMOS technology. This very high density process ises

 9.2. Size:52K  fairchild semi
nds9405.pdf pdf_icon

NDS9410A

February 1996 NNDS9405Single P-Channel Enhancement Mode Field Effect TransistorGeneral Description FeaturesThese P-Channel enhancement mode power field effect -4.3A, -20V. RDS(ON) = 0.10 @ VGS = -10Vtransistors are produced using National's proprietary, high cellHigh density cell design for extremely low RDS(ON)density, DMOS technology. This very high density process isHigh

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History: VBNC1303 | IRFS4010PBF

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